SK Hynix to Study ASML Equipment for EUV Lithography with High Numerical Aperture Value

In late December, Dutch company ASML delivered its first EUV High-NA generation lithographic scanner, characterized by a high numerical aperture and increased resolution in the production of semiconductor components. Though Intel was the first to receive this device, Korean memory manufacturer SK hynix has shown interest as well.

Memory manufacturers, including SK hynix, only began using EUV lithography equipment in 2021 for the production of DRAM memory chips. At a recent South Korean Semiconductor Manufacturers Association event, SK hynix CEO, Kwak Noh-jung, shared certain company plans related to business development, as reported by Business Korea.

Firstly, Kwak stated he cannot comment on rumors about SK hynix’s readiness to build an HBM chip packaging facility in Indiana, US. All American states, he noted, are potential candidates for such an establishment.

Secondly, the CEO of SK hynix denied resumption of negotiations between Western Digital and Kioxia about purchasing Kioxia’s business. He reconfirmed SK hynix’s unchanged stance on this matter, which had previously halted the negotiations. However, he added that SK hynix would always be open to mutually beneficial collaborations if Kioxia is willing.

Lastly, Kwak acknowledged that SK hynix is preparing to acquire the EUV High-NA lithography equipment from ASML for memory chip production. He declined to specify when this equipment will be put to use in the company’s mass production, but assured it would be put into operation at the right time.

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